- Ion beam deposition
Ion Beam Deposition (IBD) is a process of applying materials to a target through the application of an
ion beam .In an
ion source source materials - gases or evaporated solids - are ionized usingelectron ionization or by application of high electric fields (Penning ion source ). Incathodic arc systems, a high voltage arc is created that literally blasts ions out of a solid source material (used particularly forcarbon ion deposition). The ions are then accelerated and focused using high voltage. Optional deceleration at the substrate can be employed to select well-defined deposition energies, usually in the range of a few eV up to a few keV, gradually reaching the regime ofion implantation .Ion beams of select elements can be prepared by mass separation using
magnetic field s leading to the deposition of films of high purity. By repeated fast switching of the magnetic field to different masses, and monitoring of deposition process by current integration a well-definedstoichiometry can be realized.ee also
*
Cathodic Arc Deposition
*Sputter deposition
*Ion beam assisted deposition
*Ion beam induced deposition References and further reading
* 4wave Inc.'s [http://www.4waveinc.com/ibd.html Ion Beam Deposition] page with diagram of a typical IBD system
* [http://www.veeco.com Veeco] produces some IBD systems.
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ion-beam deposition — jonpluoštis nusodinimas statusas T sritis radioelektronika atitikmenys: angl. ion beam deposition vok. Abscheidung durch Ionenstrahl, f; Ionenstrahlabscheidung, f; Ionenstrahlaufdampfung, f rus. ионно лучевое осаждение, n; ионно пучковое… … Radioelektronikos terminų žodynas
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Ion source — An ion source is an electro magnetic device that is used to create charged particles. These are used primarily within mass spectrometers or particle accelerators.Mass spectrometry In mass spectrometry, an ion source is a piece of equipment used… … Wikipedia